UN 1982 Specialty Gas Mixtures 20% Oxygen With Carbon Tetrafluoride

Basic Information
Place of Origin: China
Brand Name: Newradar Gas
Certification: ISO/DOT/GB
Model Number: N/A
Minimum Order Quantity: 1000 liters
Price: negotiation
Packaging Details: 10kg, 40kg or 50kg packed in the qualified gas cylinder or packed according to the demands
Delivery Time: 15-25 working days after received your payment
Payment Terms: L/C, , T/T, Western Union, MoneyGram
Supply Ability: 3,00 cubic meter per month
Detail Information
Application: 248nm Lithography Process And Mixed With Halogen Using Mixed Gases CAS No.: 7439-90-9
UN No: 1982 Purity:: 99.999%
Package:: Seamless Steel Cylinders Other Names: Oxygen Carbon Tetrafluoride Mixture
Appearance:: Colorless Gas Cylinders Volume:: 10L,25L, 40L Or 50L
Grade Standard: Electron Grade Grade Toxic: Non-toxic
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Product Description

UN 1982 Specialty Gas Mixtures 20% Oxygen With Carbon Tetrafluoride





Specialty Gas Mixtures


Carbon Tetrafluoride is a source of fluorine or carbon fluoride free radicals used in a variety of wafer etchprocesses. Carbon Tetrafluoride is used with oxygen to etch polysilicon, silicon dioxide, and silicon nitride.


Carbon Tetrafluoride is relatively inert under normal conditions and is an asphyxiant. Under RF plasma conditions, the fluorine free radicals are typically in the form of CF3

or CF2. A higher purity CarbonTetrafluoride results in superior control of the process, which results in better dimensional and profile control.


Other halocarbons, as well as the presence of air or oxygen, are detrimental to the control of the anisotropic etch.





1. Physical properties


Major Components
O2 20 % 19.9-20.1%
CF4 Balance  







2. Typical technical data (COA)


Maximum Impurities
Carbon Dioxide (CO2) <1.0
Carbon Monoxide (CO) <1.0
Moisture (H2O) <0.5
Nitrogen (N2) <10.0
Oxygen (O2) <5.0
THC (as Methane) (CH4) <0.5
Other Halocarbons <1.0
Sulphur Hexafluoride <1.0














Cylinder Specifications* Contents Pressure
Cylinder Valve Outlet Options Pounds PSIG BAR
2 CGA 580 DISS 716 70 2000 139





UN 1982 Specialty Gas Mixtures 20% Oxygen With Carbon Tetrafluoride 0




 Tetrafluoromethane is sometimes used as a low temperature refrigerant.



 It is used in electronics microfabrication alone or in combination with oxygen as a plasma etchant for silicon, silicon dioxide, and silicon nitride.



 It also has uses in neutron detectors



Contact Details
Vicky Liu

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