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pure Refrigerant gas R23 raw material

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Good quality Rare Gases for sales
Good quality Rare Gases for sales
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pure Refrigerant gas R23 raw material

China pure Refrigerant gas R23 raw material supplier

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Product Details:

Place of Origin: CHINA
Brand Name: Newradar
Certification: ISO
Model Number: SY-R23

Payment & Shipping Terms:

Minimum Order Quantity: 200kgs
Price: USD5.9-USD13.5/KG
Packaging Details: 30kgs/48.8L
Delivery Time: 10-15 working days
Payment Terms: L/C, D/P, T/T
Supply Ability: 50000kgs per month
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Detailed Product Description
Classification: Alkyl & Derivatives CAS No.:: 75-46-7
Other Names:: R23 MF:: CHF3
EINECS No.:: 200-872-4 Place Of Origin: Hubei, China (Mainland)
Grade Standard:: Industrial Grade Purity:: 99.9%
Appearance:: Colorless ,No Turbid Application:: Refrigerant

Refrigerant gas Trifluoromethane CHF3 gas R23 gas R23

1.trifluoromethane r23 of all specifications
2.OEM is accepted
3.Purity99.9%
4.REACH/SGS/ROSH/PONY/ISO9001/ISO14001/ISO16949

 

Specifications:

 

1. Physical properties

Commodity Trifluoromethane
Molecular Formula CHF3
CAS No. 75-46-7
UN No. 1984
Hazardous Class 2.2
Cylinder Capacity 500L
Filling Weight 380kg/500L refillable cylinder
Storage and Transportation Use, store and transport below 45C. Store in cool and well-ventilated areas. Keep away from fire, heat, sunlight and flammable substances. Handle carefully when loading and unloading to avoid damages to gas cylinders and accessories.

2. Typical technical data

Trifluoromethane(R23)
Physical properties
Molecular formula CHF3
Molecular weight 70.01
Boiling point(℃) -82.1
Critical temperature (℃) 25.9
Critical pressure (MPa) 4.84
Specific Heat of Liquid, 30℃, [KJ/(kg℃)] 1.55
ODP 0.00
GWP 1.17
Ice Point,°C -152.15

 

Quality index
Purity ≥99.5%
Water content ≤20ppm
Acidity ≤1ppm
Evaporation residue ≤800ppm
Appearance Colorless and clear
Odor Odorless

Applications:

Used for supercritical extraction solvent, low temperature refrigerant As the fire extinguishing agent and preparation of tetrafluoroethylene materials, electronic industrial plasma chemical etching agent and fluoride compounds.
Plasma etching gases for microelectronics industry The etching of silicon dioxide film has the advantages of fast etching speed and good selectivity. In addition, fluoride is also used in low temperature refrigerant mixture, organic synthesis intermediate, infrared detector direct coolant and so on.
Refrigerant and tetrafluoroethylene materials

Low temperature refrigerant and as fire extinguishing agent and preparation of

tetrafluoroethylene materials.

 

Contact Details
Wuhan Newradar Special Gas Co.,Ltd

Contact Person: Suyee Su

Tel: +8618602768623

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