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UHP Gas O2 And CF4 Specialty Gas Mixtures Oxygen With Tetrafluoromethane Mixture Manufacturer

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UHP Gas O2 And CF4 Specialty Gas Mixtures Oxygen With Tetrafluoromethane Mixture Manufacturer

China UHP Gas O2 And CF4 Specialty Gas Mixtures Oxygen With Tetrafluoromethane Mixture Manufacturer supplier

Large Image :  UHP Gas O2 And CF4 Specialty Gas Mixtures Oxygen With Tetrafluoromethane Mixture Manufacturer

Product Details:

Place of Origin: China
Brand Name: newradar / accept OME
Certification: ISO/DOT/GB
Model Number: N/A

Payment & Shipping Terms:

Minimum Order Quantity: 1000 liters
Price: negotiation
Packaging Details: 10kg, 40kg or 50kg packed in the qualified gas cylinder or packed according to the demands
Delivery Time: 15-25 working days after received your payment
Payment Terms: L/C, , T/T, Western Union, MoneyGram
Supply Ability: 3,00 cubic meter per month
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Detailed Product Description
Application: 248nm Lithography Process And Mixed With Halogen Using Mixed Gases CF4: Tetrafluoromethane
UN No: 1982 Oxygen: O2
Package:: Seamless Steel Cylinders Other Names: Oxygen Carbon Tetrafluoride Mixture
Appearance:: Colorless Gas Cylinders Volume:: 10L,25L, 40L Or 50L
Grade Standard: Electron Grade Grade Toxic: Non-toxic

 

UHP Gas O2 And CF4 Specialty Gas Mixtures Oxygen With Tetrafluoromethane Mixture Manufacturer

 

Description:

 

Anisotropic etch.control. Other halocarbons, as well as the presence of air or oxygen, are detrimental to the control of theTetrafluoride results in superior control of the process, which results in better dimensional and profile. A higher purity Carbonor CF2conditions, the fluorine free radicals are typically in the form of CF3Carbon Tetrafluoride is relatively inert under normal conditions and is an asphyxiant. Under RF plasmaprocesses. Carbon Tetrafluoride is used with oxygen to etch polysilicon, silicon dioxide, and silicon nitride.Carbon Tetrafluoride is a source of fluorine or carbon fluoride free radicals used in a variety of wafer etch

 

 

Specifications:

 

1. Physical properties

 

Major Components
COMPONENTS CONCENTRATION RANGE
O2 20 % 19.9-20.1%
CF4 Balance  

 

 

 

 

 

 

2. Typical technical data (COA)

 

Maximum Impurities
COMPONENTS CONCENTRATION (ppm)
Carbon Dioxide (CO2) <1.0
Carbon Monoxide (CO) <1.0
Moisture (H2O) <0.5
Nitrogen (N2) <10.0
Oxygen (O2) <5.0
THC (as Methane) (CH4) <0.5
Other Halocarbons <1.0
Sulphur Hexafluoride <1.0

 

 

 

 

 

 

 

 

 

 

 

 

 

Cylinder Specifications* Contents Pressure
Cylinder Valve Outlet Options Pounds PSIG BAR
2 CGA 580 DISS 716 70 2000 139

 

 

 

 

 

Applications:

 

1

 Tetrafluoromethane is sometimes used as a low temperature refrigerant.

 

2

 It is used in electronics microfabrication alone or in combination with oxygen as a plasma etchant for silicon, silicon dioxide, and silicon nitride.

 

3

 It also has uses in neutron detectors

 

 

Contact Details
Wuhan Newradar Special Gas Co.,Ltd

Contact Person: Bella

Tel: +8615927358762

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