Place of Origin: | China |
---|---|
Brand Name: | Newradar Gas |
Certification: | ISO/DOT/GB |
Model Number: | N/A |
Minimum Order Quantity: | 1000 liters |
Price: | negotiation |
Packaging Details: | 10kg, 40kg or 50kg packed in the qualified gas cylinder or packed according to the demands |
Delivery Time: | 15-25 working days after received your payment |
Payment Terms: | L/C, , T/T, Western Union, MoneyGram |
Supply Ability: | 3,00 cubic meter per month |
CAS No.: | 7439-90-9 | UN No: | 1982 |
---|---|---|---|
Purity:: | 99.999% | Package:: | Seamless Steel Cylinders |
Other Names: | Oxygen Carbon Tetrafluoride Mixture | Appearance:: | Colorless Gas |
Cylinders Volume:: | 10L,25L, 40L Or 50L | Grade Standard: | Electron Grade Grade |
Toxic: | Non-toxic | Application: | 248nm Lithography Process And Mixed With Halogen Using Mixed Gases |
Highlight: | air products specialty gases,air liquide specialty gases |
Specialty Gas Mixtures 20% Oxygen With Carbon tetrafluoride CF4 Mixted O2 For etch polysilicon , and silicon dioxide
Description:
Specialty Gas Mixtures
Carbon Tetrafluoride is a source of fluorine or carbon fluoride free radicals used in a variety of wafer etchprocesses. Carbon Tetrafluoride is used with oxygen to etch polysilicon, silicon dioxide, and silicon nitride.
Carbon Tetrafluoride is relatively inert under normal conditions and is an asphyxiant. Under RF plasma conditions, the fluorine free radicals are typically in the form of CF3
or CF2. A higher purity CarbonTetrafluoride results in superior control of the process, which results in better dimensional and profile control.
Other halocarbons, as well as the presence of air or oxygen, are detrimental to the control of the anisotropic etch.
Specifications:
1. Physical properties
Major Components | ||
COMPONENTS | CONCENTRATION | RANGE |
O2 | 20 % | 19.9-20.1% |
CF4 | Balance |
2. Typical technical data (COA)
Maximum Impurities | |
COMPONENTS | CONCENTRATION (ppm) |
Carbon Dioxide (CO2) | <1.0 |
Carbon Monoxide (CO) | <1.0 |
Moisture (H2O) | <0.5 |
Nitrogen (N2) | <10.0 |
Oxygen (O2) | <5.0 |
THC (as Methane) (CH4) | <0.5 |
Other Halocarbons | <1.0 |
Sulphur Hexafluoride | <1.0 |
Cylinder Specifications* | Contents | Pressure | |||
Cylinder | Valve Outlet Options | Pounds | PSIG | BAR | |
2 | CGA 580 | DISS 716 | 70 | 2000 | 139 |
Applications:
1 |
Tetrafluoromethane is sometimes used as a low temperature refrigerant.
|
2 |
It is used in electronics microfabrication alone or in combination with oxygen as a plasma etchant for silicon, silicon dioxide, and silicon nitride.
|
3 |
It also has uses in neutron detectors
|