Classification: | Alkyl & Derivatives | CAS No.:: | 75-46-7 |
---|---|---|---|
Other Names:: | R23 | MF:: | CHF3 |
EINECS No.:: | 200-872-4 | Place Of Origin: | Hubei, China (Mainland) |
Grade Standard:: | Industrial Grade | Purity:: | 99.9% |
Appearance:: | Colorless ,No Turbid | Application:: | Refrigerant |
High Light: | air conditioner freon gas,air conditioner gas |
Trifluoromethane is a colorless nonflammable gas. Trifluoromethane is shipped as a liquid under pressure. Trifluoromethane may be narcotic in high concentrations. Under prolonged exposure to fire or heat the containers may rupture violently and rocket. Trifluoromethane is used as a refrigerant.TRIFLUOROMETHANE, R-23, is chemically inert in many situations, but can react violently with strong reducing agents such as the very active metals and the active metals. They suffer oxidation with strong oxidizing agents and under extremes of temperature.Vapors may cause dizziness or asphyxiation without warning. Vapors from liquefied gas are initially heavier than air and spread along ground. Contact with gas or liquefied gas may cause burns, severe injury and/or frostbite. Fire may produce irritating, corrosive and/or toxic gases.
Some may burn but none ignite readily. Containers may explode when heated. Ruptured cylinders may rocket.
Specifications:
1. Physical properties
Commodity | Trifluoromethane |
Molecular Formula | CHF3 |
CAS No. | 75-46-7 |
UN No. | 1984 |
Hazardous Class | 2.2 |
Cylinder Capacity | 500L |
Filling Weight | 380kg/500L refillable cylinder |
Storage and Transportation | Use, store and transport below 45C. Store in cool and well-ventilated areas. Keep away from fire, heat, sunlight and flammable substances. Handle carefully when loading and unloading to avoid damages to gas cylinders and accessories. |
2. Typical technical data
Trifluoromethane(R23) | |
Physical properties | |
Molecular formula | CHF3 |
Molecular weight | 70.01 |
Boiling point(℃) | -82.1 |
Critical temperature (℃) | 25.9 |
Critical pressure (MPa) | 4.84 |
Specific Heat of Liquid, 30℃, [KJ/(kg℃)] | 1.55 |
ODP | 0.00 |
GWP | 1.17 |
Ice Point,°C | -152.15 |
Quality index | |
Purity | ≥99.5% |
Water content | ≤20ppm |
Acidity | ≤1ppm |
Evaporation residue | ≤800ppm |
Appearance | Colorless and clear |
Odor | Odorless |
Applications:
Used for supercritical extraction solvent, low temperature refrigerant | As the fire extinguishing agent and preparation of tetrafluoroethylene materials, electronic industrial plasma chemical etching agent and fluoride compounds. |
Plasma etching gases for microelectronics industry | The etching of silicon dioxide film has the advantages of fast etching speed and good selectivity. In addition, fluoride is also used in low temperature refrigerant mixture, organic synthesis intermediate, infrared detector direct coolant and so on. |
Refrigerant and tetrafluoroethylene materials |
Low temperature refrigerant and as fire extinguishing agent and preparation of tetrafluoroethylene materials.
|