Colorless Excimer Laser Gases Premix Gas ArF Laser For UV Light

Basic Information
Place of Origin: China
Brand Name: Newradar Gas
Certification: ISO/DOT/GB
Model Number: N/A
Minimum Order Quantity: 1pcs
Price: negotiation
Packaging Details: Packed in10L-50L cylinder or packed according to the demands.
Delivery Time: 25 working days after received your payment
Payment Terms: L/C, , T/T, Western Union, MoneyGram
Supply Ability: 500 pcs per month
Detail Information
Product Name: Argon Fluoride Mixtures Filling Gas: Argon, Neon And Fluorine Gas Mixtures
Valve Type: CGA679 Molar Mass: 59.954 G/mol
Color: Colorless Valve Outlet: Diss 728
High Light:

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Product Description

Colorless Excimer Laser Gases Premix Gas ArF Laser For UV Light






The UV light from an ArF laser is well absorbed by biological matter and organic compounds. Rather than burning or cutting material, the ArF laser dissociates the molecular bonds of the surface tissue, which disintegrates into the air in a tightly controlled manner through ablation rather than burning.


Thus the ArF and other excimer lasers have the useful property that they can remove exceptionally fine layers of surface material with almost no heating or change to the remainder of the material which is left intact. These properties make such lasers well suited to precision micromachining organic materials (including certain polymers and plastics), and especially delicate surgeries such as eye surgery.


Recently, through the use of a novel diffractive diffuse system composed of two microlens arrays, surface micromachining by ArF laser on fused silica has been performed with submicrometer accuracy.




1. Physical properties


Commodity Argon Fluoride gas
Molecular Formula ArF
Phase Gas


Hazardous class for transort 2.2


2. Typical technical data (COA)


Major Components
Fluorine 1.0% 0.9-1.0%
Argon 3.5% 3.4-3.6%
Neon Balance  
Maxinum Impurities
Carbon Dioxide (CO2) <5.0
Carbon Monoxide (CO) <1.0
Carbon Tetrafluoride (CF4) <2.0
Carbonyl Fluoride (COF2) <2.0
Helium (He) <8.0
Moisture (H2O) <25.0
Nitrogen (N2) <25.0
Nitrogen Trifluoride (NF3) <1.0
Oxygen (O2) <25.0
Silicon Tetrafluoride (SiF4) <2.0
Sulfur Hexafluoride (SF6) <1.0
THC (as Methane) (CH4) <1.0
Xenon (Xe) <10.0


3. Package


Cylinder Specifications Contents Pressure
Cylinder Valve Outlet Options Cubic Feet Liters PSIG BAR
1 CGA679 DISS 728 265 7500 2000 139
2 CGA679 DISS 728 212 6000 2000 139
3 CGA679 DISS 728 71 2000 1800 125




Argon Fluoride Mixtures are used in 193 nm lithography applications, usually in conjunction with an inert gas mixture.


Colorless Excimer Laser Gases Premix Gas ArF Laser For UV Light 0

Contact Details
Vicky Liu

Phone Number : 86-27-82653381

WhatsApp : +8613667126861