Wuhan Newradar Special Gas Co.,Ltd
Your Reliable Special Gas & Equipment
One-Stop Supplier
Wuhan Newradar Special Gas Co.,Ltd
Your Reliable Special Gas & Equipment
One-Stop Supplier
Product Details:
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| Product Name: | Argon Fluoride Mixtures | Filling Gas: | Argon, Neon And Fluorine Gas Mixtures |
|---|---|---|---|
| Valve Type: | CGA679 | Molar Mass: | 59.954 G/mol |
| Molar Mass: | 59.954 G/mol | Color: | Colorless |
| Color: | Colorless | Valve Outlet: | Diss 728 |
| Valve Outlet: | Diss 728 |
Colorless Excimer Laser Gases Premix Gas ArF Laser For UV Light
Description:
The UV light from an ArF laser is well absorbed by biological matter and organic compounds. Rather than burning or cutting material, the ArF laser dissociates the molecular bonds of the surface tissue, which disintegrates into the air in a tightly controlled manner through ablation rather than burning.
Thus the ArF and other excimer lasers have the useful property that they can remove exceptionally fine layers of surface material with almost no heating or change to the remainder of the material which is left intact. These properties make such lasers well suited to precision micromachining organic materials (including certain polymers and plastics), and especially delicate surgeries such as eye surgery.
Recently, through the use of a novel diffractive diffuse system composed of two microlens arrays, surface micromachining by ArF laser on fused silica has been performed with submicrometer accuracy.
Specifications:
1. Physical properties
| Commodity | Argon Fluoride gas |
| Molecular Formula | ArF |
| Phase | Gas |
| Color |
Colorless |
| Hazardous class for transort | 2.2 |
2. Typical technical data (COA)
| Major Components | |||
| COMPONENTS | CONCENTRATION | RANGE | |
| Fluorine | 1.0% | 0.9-1.0% | |
| Argon | 3.5% | 3.4-3.6% | |
| Neon | Balance | ||
| Maxinum Impurities | |||
| COMPONENT | CONCENTRATION(ppmv) | ||
| Carbon Dioxide (CO2) | <5.0 | ||
| Carbon Monoxide (CO) | <1.0 | ||
| Carbon Tetrafluoride (CF4) | <2.0 | ||
| Carbonyl Fluoride (COF2) | <2.0 | ||
| Helium (He) | <8.0 | ||
| Moisture (H2O) | <25.0 | ||
| Nitrogen (N2) | <25.0 | ||
| Nitrogen Trifluoride (NF3) | <1.0 | ||
| Oxygen (O2) | <25.0 | ||
| Silicon Tetrafluoride (SiF4) | <2.0 | ||
| Sulfur Hexafluoride (SF6) | <1.0 | ||
| THC (as Methane) (CH4) | <1.0 | ||
| Xenon (Xe) | <10.0 | ||
3. Package
| Cylinder Specifications | Contents | Pressure | ||||
| Cylinder | Valve Outlet Options | Cubic Feet | Liters | PSIG | BAR | |
| 1 | CGA679 | DISS 728 | 265 | 7500 | 2000 | 139 |
| 2 | CGA679 | DISS 728 | 212 | 6000 | 2000 | 139 |
| 3 | CGA679 | DISS 728 | 71 | 2000 | 1800 | 125 |
Applications:
Argon Fluoride Mixtures are used in 193 nm lithography applications, usually in conjunction with an inert gas mixture.
