99.9% Purity Plus Specialty Gases Hexafluoro-2-Butyne For Semiconductor Industry

Basic Information
Place of Origin: China
Brand Name: Newradar Gas
Certification: ISO9001
Model Number: NO
Minimum Order Quantity: 30KGS
Price: negotiation
Packaging Details: 30lb - 926L Cylinder package
Delivery Time: 5-10 DAYS
Supply Ability: 30TON
Detail Information
CAS No.:: 685-63-2 Other Names:: 1,1,2,3,4,4-hexafluorbuta-1,3-dieen
Hazard Class: 2.3 Place Of Origin:: WUHAN
Purity:: 99.9% Application:: Semiconductor Industry
Brand Name:: NEWRADAR Beschrijving: Toxisch, Ontvlambaar Gas
High Light:

electric gas


purity plus specialty gases

Product Description

Purity 99.9% Hexafluoro-2-butyne, Use in semiconductor industry.




Hexafluoro1,3‐butadine is a toxic, colorless, odorless, flammable liquefied compressed gas.


C4F6 gas as an etchant gas for a high aspect ratio contact hole etching can be a good

alternative to PFC gases.


hexafluoro-1,3-butadiene (C4F6) dry etching gas it has developed in Russia. C4F6 enables dry etching at a line width of as narrow as 90 nm or less. It is therefore indispensable for processing system LSIs and high-speed, large-capacity memory devices that are increasingly used in digital electric appliances and liquid crystal displays.


Fluorocarbon gases are widely used for processing silicon oxide film. Compared with octafluorocyclobutane (C4F8) currently used for processing at the line width of 130 nm, C4F6 has the following advantages:


1.Very low environmental load as it is decomposed in less than two days in the atmosphere (compared with 3,200 years for C4F8)


2.Therefore, useful as an alternative to perfluorocarbons with high global warming potential.


3.High aspect ratio, resulting in narrow and deep grooves (suitable for processing at very narrow line width).


4.High selectivity (ensures etching of silicon oxide film only; does not affect photoresist, silicon substrate or nitride film)

99.9% Purity Plus Specialty Gases Hexafluoro-2-Butyne For Semiconductor Industry 0

Fysische eigenschappen


Aggregatietoestand gasvormig
Dichtheid (bij 15°C) 1,427 g/cm³
Kookpunt ca. -130 °C
Smeltpunt ca. -130 °C
Dampdruk ca. 6 °C
Onoplosbaar in (bij 20°C) 178.800 Pa




1. C4F6 can also be used as a kind of monomer.

2. It can use in the semiconductor processing materials operation



Contact Details
Vicky Liu

Phone Number : 86-27-82653381

WhatsApp : +8613667126861