Etching Gas R14 Tetrafluoromethane 99.999% Carbon Tetrafluoride CF4 Electron Gas

Etching Gas R14 , Tetrafluoromethane 99.999% , Carbon Tetrafluoride CF4

Description:

Tetrafluoromethane, also known as carbon tetrafluoride, is the simplest fluorocarbon(CF4) . It has

a very high bond strength due to the nature of the carbon-fluorine bond.

Carbon–fluorine bonds are the strongest single bonds in organic chemistry. Additionally, they strengthen as more carbon–fluorine bonds are added to the same carbon. In the one carbon organofluorine compounds represented by molecules of fluoromethane, difluoromethane, trifluoromethane, and tetrafluoromethane, the carbon–fluorine bonds are strongest in tetrafluoromethane. This effect is due to the increased coulombic attractions between the fluorine atoms and the carbon because the carbon has a positive partial charge of 0.76.

Specifications:

Applications:

1.Tetrafluoromethane is sometimes used as a low temperature refrigerant.

2.It is used in electronics microfabrication alone or in combination with oxygen as a plasma etchant for

   silicon,silicon dioxide,and silicon nitride.

3.It also has uses in neutron detectors.

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