Place of Origin: | China |
---|---|
Brand Name: | Newradar Gas |
Certification: | ISO/DOT/GB |
Model Number: | N/A |
Minimum Order Quantity: | 1000 kilogram |
Price: | negotiation |
Packaging Details: | standard export packing:each cylinder to be protected by two poly-nets,standing on wooden pallet wrapped by plastic film |
Delivery Time: | 15-25 working days after received your payment |
Payment Terms: | L/C, , T/T, Western Union, MoneyGram |
Supply Ability: | 3,00 ton per month |
Health Risks: | High Relative Density | IPCC List Of Greenhouse Gases.: | Yes |
---|---|---|---|
Other Names: | Carbon Hexafluoride, 1,1,1,2,2,2-Hexafluoroethane, Perfluoroethane, Ethforane, Halocarbon 116, PFC-116, CFC-116, R-116, Arcton 116, Halon 2600 | Appearance:: | Colorless Liquefied Gas |
UN NO.: | 2193 | Grade Standard: | Electron Grade Industrial Grade |
Synonyms: | 1,1,1,2,2,2-Hexafluoroethane;C2F6;ethane,hexafluoro-;Ethylhexafluoride;f116;F-116;FC1160;Fluorocarbon 116 | Application: | Electronics Equipment,transformer,refrigerating Fluid |
MF:: | C2F6 | ||
High Light: | electric gas,purity plus specialty gases |
Description:
Hexafluoroethane can be used in a multi-functional etching technology, common in the production of semiconductors. It can be used for metal silicide and metal oxide and selective etching with respect to its metal matrix. In addition, it is also used to etch silicon on silicon.
Hexafluoroethane can be used together with trifluoromethane for refrigerant R508A (hexafluoroethane 61%) and R508B (hexafluoroethane 54%).
Specifications:
1. Physical properties
Commodity |
Hexafluoroethane |
Molecular Formula |
R116 |
CAS No |
76-16-4 |
UN No. |
2193 |
Hazardous Class |
2.2 |
MF: |
C2F6 |
Cylinder Capacity |
40L, 500L |
Filling Weight |
530kg/500L refillable cylinder 20kg/40L refillable cylinder |
Storage and Transportation |
Use, store and transport below 45C. Store in cool and well-ventilated areas. Keep away from fire, heat, sunlight and flammable substances. Handle carefully when loading and unloading to avoid damages to gas cylinders and accessories. |
2. Typical technical data
Purity, % | ≥99.8 |
Moisture, PPm | ≤10 |
Acidity, PPm | ≤1 |
Vapor Residue, PPm | ≤100 |
Appearance | Colorless, No turbid |
Odor | No Strange Stench |
Molecular Weight | 66.1 |
Boiling Point, °C | -24.7 |
Critical Temperature, °C | 113.5 |
Critical Pressure, Mpa | 4.58 |
Specific Heat of Liquid, 30°C, [KJ/(kg°C)] | 1.68 |
ODP | 0 |
GWP | 0.014 |
Applications:
Multi - Functional Etching Technology | In The Production Of Semiconductor etching of metal |
The Metal Substrate |
It can be used in the selective etching of metal silicon metal and metal oxide. Under prolonged exposure to fire or intense heat the containers may rupture violently and rocket. |