products

High Relative Density Electronic Gases Purity 99.9% Hexafluoroethane F116

Basic Information
Place of Origin: China
Brand Name: newradar
Certification: ISO/DOT/GB
Model Number: N/A
Minimum Order Quantity: 1000 kilogram
Price: negotiation
Packaging Details: standard export packing:each cylinder to be protected by two poly-nets,standing on wooden pallet wrapped by plastic film
Delivery Time: 15-25 working days after received your payment
Payment Terms: L/C, , T/T, Western Union, MoneyGram
Supply Ability: 3,00 ton per month
Detail Information
Health Risks: High Relative Density IPCC List Of Greenhouse Gases.: Yes
Other Names: Carbon Hexafluoride, 1,1,1,2,2,2-Hexafluoroethane, Perfluoroethane, Ethforane, Halocarbon 116, PFC-116, CFC-116, R-116, Arcton 116, Halon 2600 Appearance:: Colorless Liquefied Gas
UN NO.: 2193 Grade Standard: Electron Grade Industrial Grade
Synonyms: 1,1,1,2,2,2-Hexafluoroethane;C2F6;ethane,hexafluoro-;Ethylhexafluoride;f116;F-116;FC1160;Fluorocarbon 116 Application: Electronics Equipment,transformer,refrigerating Fluid
MF:: C2F6
High Light:

electric gas

,

purity plus specialty gases


Product Description

Purity 99.9% Hexafluoroethane, F116 For Etching Of Silicon Dioxide Over Silicon

Description:

 

Hexafluoroethane can be used in a multi-functional etching technology, common in the production of semiconductors. It can be used for metal silicide and metal oxide and selective etching with respect to its metal matrix. In addition, it is also used to etch silicon on silicon.

 

Hexafluoroethane can be used together with trifluoromethane for refrigerant R508A (hexafluoroethane 61%) and R508B (hexafluoroethane 54%).

 

Specifications:

 

1. Physical properties

 

Commodity

 Hexafluoroethane

Molecular Formula

 R116

CAS No

 76-16-4

UN No.

 

2193

Hazardous Class

 2.2

MF:

 C2F6

Cylinder Capacity

 40L, 500L

Filling Weight

 530kg/500L refillable cylinder

 20kg/40L refillable cylinder

Storage and Transportation

 Use, store and transport below 45C. Store in cool and well-ventilated areas. Keep away from fire, heat, sunlight and flammable substances. Handle carefully when loading and unloading to avoid damages to gas cylinders and accessories.

 

2. Typical technical data

 

Purity, % ≥99.8
Moisture, PPm ≤10
Acidity, PPm ≤1
Vapor Residue, PPm ≤100
Appearance Colorless, No turbid
Odor No Strange Stench

 

 

 

 

 

 

 

 

Molecular Weight 66.1
Boiling Point, °C -24.7
Critical Temperature, °C 113.5
Critical Pressure, Mpa 4.58
Specific Heat of Liquid, 30°C, [KJ/(kg°C)] 1.68
ODP 0
GWP 0.014

 

 

 

 

 

 

 

 

 

Applications:

 

Multi - Functional Etching Technology In The Production Of Semiconductor etching of metal
The Metal Substrate

It can be used in the selective etching of metal silicon metal and metal oxide.

Under prolonged exposure to fire or intense heat the containers may rupture violently and rocket.

 

 

Contact Details
Vicky Liu

Phone Number : 86-27-82653381

WhatsApp : +8613667126861