Carbon Hexafluoride Purity Plus Specialty Gases CAS No 76-16-4 Purity Cylinder Gas

Basic Information

Place of Origin:	China
Brand Name:	Newradar Gas
Certification:	ISO/DOT/GB
Model Number:	N/A

Minimum Order Quantity:	1000 kilogram
Price:	negotiation
Packaging Details:	standard export packing:each cylinder to be protected by two poly-nets,standing on wooden pallet wrapped by plastic film
Delivery Time:	15-25 working days after received your payment
Payment Terms:	L/C, , T/T, Western Union, MoneyGram
Supply Ability:	3,00 ton per month

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Detail Information

IUPAC Name:	Hexafluoroethane	EINECS No.::	200-939-8
Purity::	99.9%	Other Names:	Carbon Hexafluoride
Appearance::	Colorless Liquefied Gas	UN NO.:	2193
Grade Standard:	Electron Grade Industrial Grade	Synonyms:	1,1,1,2,2,2-Hexafluoroethane;C2F6;ethane,hexafluoro-;Ethylhexafluoride;f116;F-116;FC1160;Fluorocarbon 116
Application:	Electronics Equipment,transformer,refrigerating Fluid	MF::	C2F6
MW::	138.01
Highlight:	electric gas , purity plus specialty gases

Product Description

Purity 99.9% UN 2193, Fluorocarbon 116 Used As A Versatile Etchant In Semiconductor Manufacturing

Description:

Hexafluoroethane (perfluoroethane, C2F6) use

Hexafluoroethane (C2F6) in the microelectronics industry is mainly used as an etchant; also used as mixed ultra-low temperature mixed refrigerant.

Hexafluoroethane (perfluoroethane, C2F6) packaging

Reusable high pressure cylinder packaging (need to recover packaging cylinders): 5kg / bottle, 40kg / bottle.

Specifications:

1. Physical properties

Commodity	Hexafluoroethane
Molecular Formula	R116
CAS No	76-16-4
UN No.	2193
Hazardous Class	2.2
MF:	C2F6
Cylinder Capacity	40L, 500L
Filling Weight	530kg/500L refillable cylinder 20kg/40L refillable cylinder
Storage and Transportation	Use, store and transport below 45C. Store in cool and well-ventilated areas. Keep away from fire, heat, sunlight and flammable substances. Handle carefully when loading and unloading to avoid damages to gas cylinders and accessories.

2. Typical technical data

Molecular Weight	66.1
Boiling Point, °C	-24.7
Critical Temperature, °C	113.5
Critical Pressure, Mpa	4.58
Specific Heat of Liquid, 30°C, [KJ/(kg°C)]	1.68
ODP	0
GWP	0.014

Applications:

Multi - Functional Etching Technology

In The Production Of Semiconductor etching of metal

The Metal Substrate

It can be used in the selective etching of metal silicon metal and metal oxide.

Under prolonged exposure to fire or intense heat the containers may rupture violently and rocket.

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