Place of Origin: | China |
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Brand Name: | Newradar Gas |
Certification: | ISO/DOT/GB |
Model Number: | N/A |
Minimum Order Quantity: | 1pcs |
Price: | negotiation |
Packaging Details: | Packed in10L-50L cylinder or packed according to the demands. |
Delivery Time: | 20 working days after received your payment |
Payment Terms: | L/C, , T/T, Western Union, MoneyGram |
Supply Ability: | 500 pcs per month |
Mixtures: Fluorine Excimer Lasers: | Fluorine Krypton Neon Mixtures | Multi-gas Lasers.: | Fluoride, Krypton And Neon Gas Mixtures |
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Valve Type: | CGA 679 | Odor: | Odorless |
Color: | Colorless | Valve Outlet: | DISS 718 |
High Light: | laser gas mixtures,msds natural gas |
Fluorine Excimer Lasers Mixture Gas Premix Gas Fluorine Krypton And Neon
Description:
Mixtures: Fluorine Excimer Lasers
Excimer lasers are multi-gas lasers. Output wavelength is a function of the rare gas/halogen combination. Excimer is the name of the rare gas / halide molecule. There are four wavelengths (spectral lines) that can be generated from fluorine mixtures.
Specifications:
1. Physical properties
Major Components | ||
COMPONENTS | CONCENTRATION | RANGE |
Fluorine | 1.0% | 0.9-1.0% |
Krypton | 1.25% | 1.2-1.3% |
Neon | Balance |
2. Typical technical data (COA)
Maxinum Impurities | |
COMPONENT | CONCENTRATION(ppmv) |
Carbon Dioxide (CO2) | <5.0 |
Carbon Monoxide (CO) | <1.0 |
Carbon Tetrafluoride (CF4) | <2.0 |
Carbonyl Fluoride (COF2) | <2.0 |
Helium (He) | <8.0 |
Hydrogen Fluoride/Moisture (HF/H2O) | <25.0 |
Nitrogen (N2) | <25.0 |
Nitrogen Trifluoride (NF3) | <1.0 |
Oxygen (O2) | <25.0 |
Sulfur Hexafluoride (SF6) | <1.0 |
Silicon Tetrafluoride (SiF4) | <2.0 |
THC (as Methane) (CH4) | <1.0 |
Xenon (Xe) | <1.0 |
3. Package
Cylinder Specifications | Contents | Pressure | ||||
Cylinder | Valve Outlet Options | Cubic Feet | Liters | PSIG | BAR | |
1 | CGA679 | DISS 728 | 265 | 7500 | 2000 | 139 |
2 | CGA679 | DISS 728 | 212 | 6000 | 2000 | 139 |
3 | CGA679 | DISS 728 | 71 | 2000 | 1800 |
125 |
Applications:
Krypton Fluoride Mixtures are used in 248 nm lithography applications, usually in conjunction with
an inert gas mixture.