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Custom Excimer Laser Gases Argon Fluoride Laser For 193nm Lithography

Basic Information
Place of Origin: China
Brand Name: Newradar
Certification: ISO/DOT/GB
Model Number: N/A
Minimum Order Quantity: 1pcs
Price: negotiation
Packaging Details: Packed in10L-50L cylinder or packed according to the demands.
Delivery Time: 25 working days after received your payment
Payment Terms: L/C, , T/T, Western Union, MoneyGram
Supply Ability: 500 pcs per month
Detail Information
Product Name: Argon Fluoride Mixtures Filling Gas: Argon, Neon And Fluorine Gas Mixtures
Valve Type: CGA679 Application: Excimer Lasers
Cylinder Volume: 4-50L Or Customise Filling Pressure: 1800-2000 Psig
High Light:

laser gas mixtures

,

msds natural gas


Product Description

Custom Excimer Laser Gases Argon Fluoride Laser For 193nm Lithography

 

 

Description:

 

Argon Fluoride Mixtures are used in 193 nm lithography applications, usually in conjunction with an inert gas mixture.

 

The argon fluoride laser is a particular type of excimer laser, which is sometimes called an exciplex laser. With its 193 nanometer wavelength, it is a deep ultraviolet laser, which is commonly used in the production of semiconductor integrated circuits, eye surgery, micromachining, and scientific research. The term excimer is short for "excited dimer", while exciplex is short for "excited complex". An excimer laser typically uses a mixture of a noble gas and a halogen gas, which under suitable conditions of electrical stimulation and high pressure, emits coherent stimulated radiation in the ultraviolet range.

 

ArF excimer lasers are widely used in high-resolution photolithography machines, one of the critical technologies required for microelectronic chip manufacturing. Excimer laser lithography has enabled transistor feature sizes to shrink from 800 nanometers in 1990 to 22 nanometers in 2012.

 

 

Specifications:

 

1. Physical properties

 

Commodity Argon Fluoride gas
Molecular Formula ArF
Phase Gas
Color

Colorless

Hazardous class for transort 2.2

 

2. Typical technical data (COA)

 

Major Components
COMPONENTS CONCENTRATION RANGE
Fluorine 1.0% 0.9-1.0%
Argon 3.5% 3.4-3.6%
Neon Balance  
Maxinum Impurities
COMPONENT CONCENTRATION(ppmv)
Carbon Dioxide (CO2) <5.0
Carbon Monoxide (CO) <1.0
Carbon Tetrafluoride (CF4) <2.0
Carbonyl Fluoride (COF2) <2.0
Helium (He) <8.0
Moisture (H2O) <25.0
Nitrogen (N2) <25.0
Nitrogen Trifluoride (NF3) <1.0
Oxygen (O2) <25.0
Silicon Tetrafluoride (SiF4) <2.0
Sulfur Hexafluoride (SF6) <1.0
THC (as Methane) (CH4) <1.0
Xenon (Xe) <10.0

 

3. Package

 

Cylinder Specifications Contents Pressure
Cylinder Valve Outlet Options Cubic Feet Liters PSIG BAR
1 CGA679 DISS 728 265 7500 2000 139
2 CGA679 DISS 728 212 6000 2000 139
3 CGA679 DISS 728 71 2000 1800 125

 

Applications:

 

Argon Fluoride Mixtures are used in 193 nm lithography applications, usually in conjunction with an inert gas mixture.

 

Custom Excimer Laser Gases Argon Fluoride Laser For 193nm Lithography 0

Contact Details
Vicky Liu

Phone Number : 86-27-82653381

WhatsApp : +8613667126861