| Place of Origin: | China |
|---|---|
| Brand Name: | Newradar Gas |
| Certification: | ISO/DOT/GB |
| Model Number: | N/A |
| Minimum Order Quantity: | 1pcs |
| Price: | negotiation |
| Packaging Details: | Packed in10L-50L cylinder or packed according to the demands. |
| Delivery Time: | 20 working days after received your payment |
| Payment Terms: | L/C, , T/T, Western Union, MoneyGram |
| Supply Ability: | 500 pcs per month |
| Product Name: | Krypton Neon Mixtures | Filling Gas: | Fluoride, Krypton And Neon Gas Mixtures |
|---|---|---|---|
| Valve Type: | CGA679 | Odor: | Odorless |
| Color: | Colorless | Valve Outlet: | DISS 718 |
| Highlight: | laser gas mixtures,msds natural gas |
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Neon Excimer Laser Gases Krypton Fluoride Mixtures Electrical
Description:
Krypton Fluoride Mixtures are used in 248 nm lithography applications, usually in conjunction with
an inert gas mixture.
A gas laser is a laser in which an electric current is discharged through a gas to produce coherent light. The gas laser was the first continuous-light laser and the first laser to operate on the principle of converting electrical energy to a laser light output. The first gas laser, the Helium–neon laser (HeNe), was co-invented by Iranian-Azerbaijani physicist Ali Javan and American physicist William R. Bennett, Jr. in 1960. It produced a coherent light beam in the infrared region of the spectrum at 1.15 micrometres.
Gas lasers using many gases have been built and used for many purposes.
Specifications:
1. Physical properties
| Major Components | ||
| COMPONENTS | CONCENTRATION | RANGE |
| Fluorine | 1.0% | 0.9-1.0% |
| Krypton | 1.25% | 1.2-1.3% |
| Neon | Balance | |
2. Typical technical data (COA)
| Maxinum Impurities | |
| COMPONENT | CONCENTRATION(ppmv) |
| Carbon Dioxide (CO2) | <5.0 |
| Carbon Monoxide (CO) | <1.0 |
| Carbon Tetrafluoride (CF4) | <2.0 |
| Carbonyl Fluoride (COF2) | <2.0 |
| Helium (He) | <8.0 |
| Hydrogen Fluoride/Moisture (HF/H2O) | <25.0 |
| Nitrogen (N2) | <25.0 |
| Nitrogen Trifluoride (NF3) | <1.0 |
| Oxygen (O2) | <25.0 |
| Sulfur Hexafluoride (SF6) | <1.0 |
| Silicon Tetrafluoride (SiF4) | <2.0 |
| THC (as Methane) (CH4) | <1.0 |
| Xenon (Xe) | <1.0 |
3. Package
| Cylinder Specifications | Contents | Pressure | ||||
| Cylinder | Valve Outlet Options | Cubic Feet | Liters | PSIG | BAR | |
| 1 | CGA679 | DISS 728 | 265 | 7500 | 2000 | 139 |
| 2 | CGA679 | DISS 728 | 212 | 6000 | 2000 | 139 |
| 3 | CGA679 | DISS 728 | 71 | 2000 | 1800 |
125 |
Applications:
Krypton Fluoride Mixtures are used in 248 nm lithography applications, usually in conjunction with
an inert gas mixture.
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