Place of Origin: | China |
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Brand Name: | Newradar Gas |
Certification: | ISO/DOT/GB |
Model Number: | N/A |
Minimum Order Quantity: | 1pcs |
Price: | negotiation |
Packaging Details: | Packed in10L-50L cylinder or packed according to the demands. |
Delivery Time: | 20 working days after received your payment |
Payment Terms: | L/C, , T/T, Western Union, MoneyGram |
Supply Ability: | 500 pcs per month |
Product Name: | Krypton Neon Mixtures | Valve: | CGA580 |
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Pressure: | 1800-2000PSIG | Color: | Colorless |
Odor: | Odorless | Valve Outlet: | DISS 718 |
High Light: | neon noble gas,neon inert gas |
Electrical Molecular Gas Laser Kr Ne Mixtures , Laser Gas Mixtures
Description:
Krypton Neon Mixtures are used in 248 nm lithography applications, usually in conjunction with a
halogen gas mixture.
TEA lasers are energized by a high voltage electrical discharge in a gas mixture generally at or above atmospheric pressure. The acronym "TEA" stands for Transversely Excited Atmospheric.
He-Ne laser is mainly used in making holograms.
In laser printing He-Ne laser is used as a source for writing on the photosensitive material.
He-Ne lasers were used in reading the Bar Code which is imprinted on the product. They have been largely replaced by laser diodes.
Specifications:
1. Physical properties
Major Components | ||
COMPONENTS | CONCENTRATION | RANGE |
Krypton | 1.25% | 1.2-1.3% |
Neon | Balance |
|
2. Typical technical data (COA)
Maxinum Impurities | |
COMPONENT | CONCENTRATION(ppmv) |
Carbon Dioxide (CO2) | <0.5 |
Carbon Monoxide (CO) | <0.5 |
Carbon Tetrafluoride (CF4) | <0.5 |
Helium (He) | <8.0 |
Moisture (H2O) | <0.5 |
Nitrogen (N2) | <1.0 |
Oxygen (O2) | <0.5 |
THC (as Methane) (CH4) | <0.5 |
Xenon (Xe) | <1.0 |
3. Package
Cylinder Specifications | Contents | Pressure | ||||
Cylinder | Valve Outlet Options | Cubic Feet | Liters | PSIG | BAR | |
1 | CGA580 | DISS 718 | 265 | 7500 | 2000 | 139 |
2 | CGA580 | DISS 718 | 212 | 6000 | 2000 | 139 |
3 | CGA580 | DISS 718 | 71 | 2000 | 1800 | 125 |
Applications:
Krypton Neon Mixtures are used in 248 nm lithography applications, usually in conjunction with a
halogen gas mixture.