Conjunction Nitrogen Lasers Krypton Neon Mixtures Halogen Gas Mixture

Conjunction Nitrogen Lasers Krypton Neon Mixtures Halogen Gas Mixture

Description:

Krypton Neon Mixtures are used in 248 nm lithography applications, usually in conjunction with a
halogen gas mixture.

Nitrogen lasers and excimer laser are used in pulsed dye laser pumping.[5]
Ion lasers, mostly argon, are used in CW dye laser pumping.
Excimer lasers are powered by a chemical reaction involving an excited dimer, or excimer, which is a short-lived dimeric or heterodimeric molecule formed from two species, at least one of which is in an excited electronic state. They typically produce ultraviolet light, and are used in semiconductor photolithography and in LASIK eye surgery. Commonly used excimer molecules include F2 (fluorine, emitting at 157 nm), and noble gas compounds (ArF [193 nm], KrCl [222 nm], KrF [248 nm], XeCl [308 nm], and XeF [351 nm]).

Specifications:

1. Physical properties

2. Typical technical data (COA)

3. Package

Applications:

Krypton Neon Mixtures are used in 248 nm lithography applications, usually in conjunction with a
halogen gas mixture.